DEEP Clean S100 Dissolve  Epi  Exhaust  Polymer DEEP Clean S100 is a specialty cleaning formulation designed for quick, effective clean-up of silicon EPIi deposition equipment.

S100 provides an effective alternative to HF acid cleaning. Chamber, exhaust, and scrubber components can be effectively cleaned at normal maintenance cycles using DEEP Clean S100.  S100 is designed to be non-gelling and low foaming for quick, simple cleaning.

The formulation is designed to dissolve the epi exhaust polymer that builds up between maintenance cycles on silicon epi deposition equipment. S100 is a proprietary blend including fluorine salts, surfactants, wetting agents, and reaction inhibitors.   

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G2 Automated Technologies, LLC.
10500 Metric Dr Bldg 122
Dallas, Texas 75243

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